A method to fabricate high-aspect-ratio microstructures using PMMA photoresist

被引:2
|
作者
Zhang, Tianchong [1 ]
Yi, Futing [1 ]
Wang, Bo [1 ]
Liu, Jing [1 ]
Wang, Yuting [1 ]
Zhou, Yue [1 ]
机构
[1] Chinese Acad Sci, Inst High Energy Phys, 19B Yuquan Lu, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
X-RAY-LITHOGRAPHY; SU-8; PHOTORESIST; REMOVAL; RESIST;
D O I
10.1007/s00542-017-3490-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Fabrications of high-aspect-ratio microstructures (HARMS) using negative photoresist have been studied a lot by researchers recently, but the removal of the resist is still a problem. We report a method to fabricate HARMS using PMMA, a positive photoresist. A classical microstructure, densely packed micro square columns, was tried in our study. A top grid made of negative photoresists was employed to join all the separate parts together to prevent them from tilting or clumping. The development and electroplating processes were not influenced by the top grid. Excellent nickel micro-pores-structures were obtained finally, demonstrating that the method is a promising way to fabricate HARMS especially when the resist needs to be removed.
引用
收藏
页码:1223 / 1226
页数:4
相关论文
共 50 条
  • [1] A method to fabricate high-aspect-ratio microstructures using PMMA photoresist
    Tianchong Zhang
    Futing Yi
    Bo Wang
    Jing Liu
    Yuting Wang
    Yue Zhou
    [J]. Microsystem Technologies, 2018, 24 : 1223 - 1226
  • [2] Fabrication of high-aspect-ratio microstructures using SU8 photoresist
    G. Liu
    Y. Tian
    Y. Kan
    [J]. Microsystem Technologies, 2005, 11 : 343 - 346
  • [3] Fabrication of high-aspect-ratio microstructures using SU8 photoresist
    Liu, G
    Tian, Y
    Kan, Y
    [J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 11 (4-5): : 343 - 346
  • [4] A novel fabrication method for suspended high-aspect-ratio microstructures
    Yang, YJ
    Kuo, WC
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2005, 15 (11) : 2184 - 2193
  • [5] A New Method of Fixing High-Aspect-Ratio Microstructures by Gel
    Chen, Nan
    Chen, Xiangyu
    Xiong, Penghui
    Hou, Shuangyue
    Zhang, Xiaobo
    Xiong, Ying
    Liu, Gang
    Tian, Yangchao
    [J]. MICROMACHINES, 2016, 7 (07):
  • [6] Characteristics of commercial PMMA sheets used in the fabrication of extreme high-aspect-ratio microstructures
    Henry, AC
    McCarley, RL
    Das, SS
    Malek, CGK
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (07) : 2631 - 2636
  • [7] Fabrication of high-aspect-ratio microstructures using excimer laser
    Tseng, AA
    Chen, YT
    Ma, KJ
    [J]. OPTICS AND LASERS IN ENGINEERING, 2004, 41 (06) : 827 - 847
  • [8] High-aspect-ratio microstructures for magnetoelectronic applications
    Wang, T
    McCandless, AB
    Ford, S
    Kelly, KW
    Lienau, R
    Hensley, D
    Desta, Y
    Ling, ZG
    [J]. MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY VIII, 2003, 4979 : 464 - 471
  • [9] The production of high-aspect-ratio microstructures (HARMS)
    Keatch, R
    Lawrenson, B
    Finlay, M
    Lewis, B
    Horsfield, C
    [J]. FUSION TECHNOLOGY, 2000, 38 (01): : 139 - 142
  • [10] Fabrication of high-aspect-ratio hydrogel microstructures
    Tirumala, VR
    Divan, R
    Mancini, DC
    Caneba, GT
    [J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 11 (4-5): : 347 - 352