Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

被引：29

作者：

Koval, N. N. ^{[1
]}

Ivanov, Yu. F. ^{[1
]}

Lopatin, I. V. ^{[1
]}

Akhmadeev, Yu. H. ^{[1
]}

Shugurov, V. V. ^{[1
]}

Krysina, O. V. ^{[1
]}

Denisov, V. V. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia

来源：

RUSSIAN JOURNAL OF GENERAL CHEMISTRY | 2015年 / 85卷 / 05期

基金：

俄罗斯基础研究基金会;

关键词：

SUPERHARD COATINGS; ARC EVAPORATION; NANOCOMPOSITES; DEPOSITION; OXIDATION; CATHODE;

D O I：

10.1134/S1070363215050485

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.

引用

页码：1326 / 1338

页数：13

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