Study of the fabrication process of bragg gratings in channel waveguides using ultrafast radiation and the phase mask method

被引：0
|
作者：
Grobnic, Dan [1 ]
Mihailov, Stephen J. [1 ]
Smelser, Christopher W. [1 ]
机构：
[1] Commun Res Ctr, Opt Commun & Electrophoton Sect, Stn H, Ottawa, ON K2H 8S2, Canada
来源：
PHOTONICS NORTH 2007, PTS 1 AND 2 | 2007年 / 6796卷
关键词：
waveguide; Bragg grating; ultrafast optics; phase mask;
D O I：
10.1117/12.779075
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A study of the capability of the Bragg grating writing method using infrared radiation and a phase mask to inscribe Bragg gratings structures in channel waveguides was performed using as a physical model D-shaped silica fibers. Experiments made with different radiation intensities and focusing arrangements produced surface structure damage of the waveguide during Bragg grating inscription in the D-fiber core. An evaluation of the surface damage intensity threshold and the exposure conditions required to avoid it is presented.
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页数：6
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