Molecular dynamics simulations of Si/Ge cluster condensation

被引:21
|
作者
Harjunmaa, Ari [1 ]
Nordlund, Kai [1 ]
机构
[1] Univ Helsinki, Dept Phys, FIN-00014 Helsinki, Finland
关键词
Molecular dynamics; Nanocluster; Si; Ge; SILICON; FILMS; SIGE; GE;
D O I
10.1016/j.commatsci.2009.09.010
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The condensation of Si, Ge, and Si/Ge nanoclusters in an Ar atmosphere was simulated using molecular dynamics simulations. The clusters formed were made with different Si-to-Ge ratios ranging from 100% Si to 100% Ge. The results indicate that Ge atoms have a tendency to segregate to the surface of the clusters, although the magnitude of this effect depends on the potential used for the simulations. Also, there is a random tendency for the atoms to form non-spherical clusters; this tendency grows with the increased concentration of Ge atoms. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:456 / 459
页数:4
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