Illumination Source Optimization in EUV lithography for staggered Contact Holes and Pillars for DRAM Applications

被引：6

作者：

Finders, Jo ^{[1
]}

Wang, Ziyang ^{[1
]}

Mcnamara, John ^{[1
]}

Rispens, Gijsbert ^{[1
]}

Broman, Par ^{[1
]}

Ahn, Chang-Nam ^{[2
]}

Lee, Inhwan ^{[3
]}

Kim, Hwan ^{[3
]}

Kang, Junghyun ^{[3
]}

Hyun, Yoonsuk ^{[3
]}

Lim, Chang-Moon ^{[3
]}

机构：

[1] ASML Netherlands BV, Run 6501, NL-5504 DR Veldhoven, Netherlands

[2] ASML Korea, 25,5 Gil,Samsung 1 Ro, Hwasung Si 445170, Gyeonggi Do, South Korea

[3] SK Hynix, 2091 Gyeongchung Daero, Icheon Si, Gyeonggi Do, South Korea

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX | 2018年 / 10583卷

关键词：

illumination source optimization; Mask 3D induced contrast loss;

D O I：

10.1117/12.2299598

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Illumination source optimization is a very fundamental task in wafer lithography. By optimizing the incidence angles at the reticle, the combined diffraction behavior of mask and projection optics can be modified. One of the most critical parameter to control in EUV lithography is contrast at best and through focus as this drives the stochastic effects. In this work, we will look at the illumination source optimization for staggered CH and pillars for DRAM applications driven by fundamental considerations at diffraction level.

引用

页数：6

共 27 条

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Park, Sarohan
De Simone, Danilo
Tao, Zheng
Vandenberghe, Geert
Hyun, Yoonsuk
Kim, Seo-Min
Lim, Chang-Moon
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI, 2015, 9422
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Wang, Xiaolong
Tseng, Li-Ting
Mochi, Iacopo
Vockenhuber, Michaela
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Rispens, Gijsbert
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35TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE (EMLC 2019), 2019, 11177
[3] Studying Resist Performance for Contact Holes Printing using EUV Interference Lithography
Wang, Xiaolong
Tseng, Li-Ting
Kazazis, Dimitrios
Tasdemir, Zuhal
Vockenhuber, Michaela
Mochi, Iacopo
Ekinci, Yasin
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
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Wang, Xiaolong
Tseng, Li-Ting
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Mochi, Iacopo
Ekinci, Yasin
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019, 18 (01):
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 3172 - 3176
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Peth, Christian
Toettger, Holger
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ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS, 2006, 6317
[7] Optimization of a dense plasma focus device as a light source for EUV lithography
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Oliver, IR
Melnychuk, ST
Khodykin, OV
Böwering, NR
EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 634 - 647
[8] Fast EUV Lithography Source Optimization Using Cascade Compressed Sensing
Lin, Jiaxin
Dong, Lisong
Fan, Taian
Wei, Yayi
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2021, 20 (20) : 826 - 836
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Ma, Xu
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Arce, Gonzalo R.
Zhang, Lu
OPTICS EXPRESS, 2018, 26 (04): : 3738 - 3755
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Lee, SH
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EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 890 - 899

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