Fabrication of tailored nanoantennas on large areas for plasmonic devices

被引：2
|
作者：
Brodehl, Christoph [1 ,2 ]
Greulich-Weber, Siegmund [1 ,2 ]
Lindner, Joerg K. N. [1 ,2 ]
机构：
[1] Univ Paderborn, Warburger Str 100, D-33098 Paderborn, Germany
[2] CeOPP Ctr Optelect & Photon Paderborn, Warburger Str 100, D-33098 Paderborn, Germany
来源：
MATERIALS TODAY-PROCEEDINGS | 2017年 / 4卷
关键词：
nanosphere lithography; plasmonic; large area structuring; SHADOW NANOSPHERE LITHOGRAPHY; METASURFACES; MASKS;
D O I：
10.1016/j.matpr.2017.05.009
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nanosphere lithography is a low-cost technique for nanopatterning large-area samples. In this work, a more sophisticated version of this method is presented, which expands the number of possible fabricable structures. It is shown, how tailored nanostructures can be written in a highly parallelized way. By fabricating suitable plasmonic nanoantenna structures in selected areas on a surface it is shown that this technique can then be used to produce optical devices, such as beam shapers or devices for the creation of higher harmonics. (C) 2017 Elsevier Ltd.
引用
收藏
页码：S44 / S51
页数：8
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