Noninvasive plasma diagnostics in a parallel-plate reactor for RF discharges

被引：0
|
作者：
Schwarz, J
机构：
[1] Institut für Plasmaforschung, Universität Stuttgart, D-70569 Stuttgart
来源：
PLASMA CHEMISTRY AND PLASMA PROCESSING | 1996年 / 16卷 / 04期
关键词：
plasma diagnostics; RF discharge; plasma reactors; plasma modeling; self-bias; current-voltage characteristics;
D O I：
10.1007/BF01447005
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
Extensive studies on the discharge current of a 50-kHz argon glow discharge in a parallel-plate reactor has led to a model that is able to describe the discharge in a wide range of pressures and powers for the evaluation of plasma parameters. The network simulation program PSPICE can be used to simulate the model in a way easily adapted to other plasma reactors as well. This may lead to a new plasma diagnostic method that does not require a complicated setup. The behavior of the discharge current can also be used for numerical simulations of the self-bias voltage in capacitively coupled plasma reactors. The influence of power and pressure can be integrated and allows an estimation of the self-bias for given reactor geometries and process parameters.
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页码：487 / 498
页数：12
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