Femtosecond laser cutting ultra thin fused silica

被引:0
|
作者
Zheng, Jianfen [1 ,2 ]
Sun, Xiaoyan [1 ,2 ]
Zhuang, Xuye [3 ]
Hu, Youwang [1 ,2 ]
Liang, Chang [1 ,2 ]
机构
[1] Cent S Univ, State Key Lab High Performance Complex Mfg, Changsha 410083, Hunan, Peoples R China
[2] Cent S Univ, Coll Mech & Elect Engn, Changsha 410083, Hunan, Peoples R China
[3] East China Inst Photoelect IC, Bengbu 233000, Peoples R China
基金
国家重点研发计划;
关键词
femtosecond laser; laser cutting; fused silica; processing method;
D O I
10.1117/12.2506222
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Cutting of ultra thin fused silica sheets is a significant technological challenge because of these materials' brittleness and high ablation threshold. Femtosecond laser offer a great prospect for meeting this challenge. In this paper, femtosecond laser with a central wavelength of 1030 nm, a pulse duration 230 fs ablation process for cutting fused silica sheets of thickness 100 mu m. To improve cutting quality and efficiency, the experiments through optimization of laser processing parameters, including the laser energy, repetition rate and scanning speed, were carried out. And a two-step processing method was proposed for improving the quality of cross-section surface. According to experimental results, the edge along the edges without chipping and smooth cross-section surface were achieved by this method.
引用
收藏
页数:7
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