Initial nucleation process of hydroxyapatite on organosilane self-assembled monolayers

被引:3
|
作者
Ishikawa, M [1 ]
Zhu, PX [1 ]
Seo, WS [1 ]
Koumoto, K [1 ]
机构
[1] Nagoya Univ, Grad Sch Engn, Dept Appl Chem, Chikusa Ku, Nagoya, Aichi 4648603, Japan
关键词
hydroxyapatite; simulated body fluid; self-assembled-monolayer; heterogeneous-nucleation; kinetics; rate-formula;
D O I
10.2109/jcersj.108.1260_714
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Initial nucleation process of hydroxyapatite (HAp) formed from simulated body fluid (SBF) was investigated on Si substrates on which self-assembled monolayers (SAM) of 3-aminopropyltriethoxysilane (APTS) and trimethylchlorosilane (TMCS) were formed. The synthesized HAp appeared hemispherical shape composed of tiny plate-like particles. Nucleation of HAp was formed just in the early stage, and then the nucleated HAp proceeded to growth process. Saturated number density of HAp particles was ca. 10(5) to 10(6)/cm(2). Saturated number density increased with increasing calcium ion and phosphate ion concentrations in SBF, and showed slight dependence on the kind of SAM, ordered as OH is approximately equal to CH3 > NN2. These results indicate that depletion of calcium and phosphate ions in the vicinity of substrates should limit nucleation while growth of particles continues. Depletion factor in the modified nucleation rate formula gives the saturated nucleation density. It is indicated that the minimum ionic concentration for HAp nucleation depends on the kind of SAR I.
引用
收藏
页码:714 / 720
页数:7
相关论文
共 50 条
  • [1] Detecting and Removing Defects in Organosilane Self-Assembled Monolayers
    Hinckley, Adam P.
    Muscat, Anthony J.
    [J]. LANGMUIR, 2020, 36 (10) : 2563 - 2573
  • [2] Stability of antibacterial self-assembled monolayers on hydroxyapatite
    Torres, Nelson
    Oh, Sunho
    Appleford, Mark
    Dean, David D.
    Jorgensen, James H.
    Ong, Joo L.
    Agrawal, C. Mauli
    Mani, Gopinath
    [J]. ACTA BIOMATERIALIA, 2010, 6 (08) : 3242 - 3255
  • [3] Ion beam modification and patterning of organosilane self-assembled monolayers
    Ada, ET
    Hanley, L
    Etchin, S
    Melngailis, J
    Dressick, WJ
    Chen, MS
    Calvert, JM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2189 - 2196
  • [4] Organosilane self-assembled monolayers directly linked to the diamond surfaces
    Ohta, R
    Saito, N
    Inoue, Y
    Sugimura, H
    Takai, O
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (05): : 2005 - 2009
  • [5] Organosilane self-assembled monolayers formed at the vapour/solid interface
    Sugimura, H
    Hozumi, A
    Kameyama, T
    Takai, O
    [J]. SURFACE AND INTERFACE ANALYSIS, 2002, 34 (01) : 550 - 554
  • [6] Effect of Reaction Temperature on Growth of Organosilane Self-Assembled Monolayers
    Lee, Sunhyung
    Ishizaki, Takahiro
    Saito, Nagahiro
    Takai, Osamu
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (08) : 6442 - 6447
  • [7] Modification of PET surfaces with self-assembled monolayers of organosilane precursors
    Ozcam, Ali E.
    Efimenko, Kirill
    Jaye, Cherno
    Spontak, Richard J.
    Fischer, Daniel A.
    Genzer, Jan
    [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2009, 172 (1-3) : 95 - 103
  • [8] Fabrication of coplanar microstructures composed of multiple organosilane self-assembled monolayers
    Sugimura, H
    Hozumi, A
    Takai, O
    [J]. IEICE TRANSACTIONS ON ELECTRONICS, 2000, E83C (07) : 1099 - 1103
  • [9] Effects of Humidity and Solution Age on Growth of Organosilane Self-Assembled Monolayers
    Lee, Sunhyung
    Ishizaki, Takahiro
    Saito, Nagahiro
    Takai, Osamu
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (08) : 6416 - 6421
  • [10] Structural investigation of organosilane self-assembled monolayers by atomic scale simulation
    Yamamoto, H
    Watanabe, T
    Nishiyama, K
    Tatsumura, K
    Ohdomari, I
    [J]. JOURNAL DE PHYSIQUE IV, 2006, 132 : 189 - 193