Topographic reconstruction and mechanical analysis of atomic layer deposited Al2O3/TiO2 nanolaminates by nanoindentation

被引:41
|
作者
Coy, Emerson [1 ]
Yate, Luis [2 ]
Kabacinska, Zuzanna [3 ]
Jancelewicz, Mariusz [1 ]
Jurga, Stefan [1 ,4 ]
Iatsunskyi, Igor [1 ]
机构
[1] Adam Mickiewicz Univ, NanoBioMed Ctr, 85 Umultowska Str, PL-61614 Poznan, Poland
[2] CIC biomaGUNE, Paseo Miramon 182, San Sebastian 20009, Spain
[3] Adam Mickiewicz Univ, Med Phys Div, Fac Phys, Umultowska 85, PL-61614 Poznan, Poland
[4] Adam Mickiewicz Univ, Dept Macromol Phys, Umultowska 85, PL-61614 Poznan, Poland
关键词
Nanolaminates; Nanomechanical testing; 4D reconstruction; Atomic layer deposition; Thin films; Nanoindentation; THIN-FILMS; ELECTRICAL CHARACTERISTICS; DETERMINING HARDNESS; OPTICAL-PROPERTIES; ELASTIC-MODULUS; INDENTATION; SUBSTRATE; BEHAVIOR; COATINGS; SILICON;
D O I
10.1016/j.matdes.2016.09.030
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel method of nanomechanical testing of multilayered Al2O3/TiO2 nanolaminates was implemented by the nanoindentation technique. The indentation data were reconstructed and filtered by a statistical analysis algorithm and presented as a function of the penetration depth of the indenter. Results show the increment of mechanical properties on the laminates as a function of the amorphous interfaces of the individual layers and the effective control of the wear rate of the structures for further applications. The results presented show both important insights on the mechanical behavior of nanolaminates and the further applicability of the reconstruction model for error reduction on mechanical testing of nanolaminate samples. (C) 2016 Elsevier Ltd. All rights reserved.
引用
收藏
页码:584 / 591
页数:8
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