Prescribed intensity design for extended sources in three-dimensional rotational geometry

被引:12
|
作者
Wu, Rengmao [1 ]
Qin, Yi [1 ]
Hua, Hong [1 ]
Meuret, Youri [2 ]
Benitez, Pablo [3 ]
Minano, Juan C. [3 ]
机构
[1] Univ Arizona, Coll Opt Sci, Lab 3DVIS, Tucson, AZ 85721 USA
[2] Katholieke Univ Leuven, Light & Lighting Lab ESAT, B-9000 Ghent, Belgium
[3] Univ Politecn Madrid, Madrid 28223, Spain
关键词
ILLUMINATION; REFLECTORS;
D O I
10.1364/OL.40.002130
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Regulating the intensity distribution of an extended source to produce a prescribed illumination in three-dimensional (3D) rotationally symmetric geometry remains a challenging issue in illumination design. In this Letter, we present an effective method focusing on creating prescribed intensity designs for extended sources. By this method, a prescribed 3D intensity design is first converted into a two-dimensional intensity design for the extended source, a new approach is used to calculate the initial patch to generate a more stable design, and then a feedback strategy is employed to improve the performance of the aspherical lens in 3D rotational geometry. Three examples are presented to demonstrate the effectiveness of the proposed method in terms of performance and capacity for tackling complex designs. (C) 2015 Optical Society of America
引用
收藏
页码:2130 / 2133
页数:4
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