Properties of Inductively-Coupled Plasmas Driven by Multiple Low-Inductance Internal-Antenna Units

被引：13

作者：

Takenaka, Kosuke ^{[1
]}

Setsuhara, Yuichi ^{[1
]}

Nishisaka, Kazuaki ^{[2
]}

Ebe, Akinori ^{[2
]}

机构：

[1] Osaka Univ, Joining & Welding Res Inst, Osaka 5670047, Japan

[2] EMD Corp, Nishikyo Ku, Kyoto 6158245, Japan

来源：

PLASMA PROCESSES AND POLYMERS | 2007年 / 4卷

关键词：

density; distribution; high-density plasma; inductively-coupled plasma; internal antenna; large area; plasma source;

D O I：

10.1002/ppap.200732318

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have developed cylindrical RF plasma sources sustained with multiple low-inductance antenna (LIA) units and have measured plasma parameters for argon plasmas. The plasma source could be operated at 2 000 W RF powers to attain plasma densities as high as 10(12) cm(-3). The plasma potential as low as 13-14 V in high-density plasmas has been achieved and the potential drop from plasma potential to floating potential was almost constant at 10 V. Kinetic energy distributions of Ar ions were measured at argon pressures around 1.3 Pa in an RF power range of 200-2 000 W, which have peaks which almost correspond to the magnitude of the plasma potential.

引用

页码：S1009 / S1012

页数：4

共 49 条

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Takenaka, Kosuke
Setsuhara, Yuichi
Nishisaka, Kazuaki
Ebe, Akinori
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[2] Characterization of inductively-coupled RF plasma sources with multiple low-inductance antenna units
Takenaka, Kosuke
Setsuhara, Yuichi
Nishisaka, Kazuaki
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[3] Plasma Profiles of Inductively Coupled Plasmas Sustained with Low-Inductance Internal Antenna
Takenaka, Kosuke
Sera, Takashi
Ebe, Akinori
Setsuhara, Yuichi
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Setsuhara, Yuichi
Takenaka, Kosuke
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Takenaka, Kosuke
Setsuhara, Yuichi
Nishisaka, Kazuaki
Ebe, Akinori
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Takenaka, Kosuke
Setsuhara, Yuichi
Nishisakai, Kazuaki
Ebe, Akinori
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (08) : 6900 - 6902
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Setsuhara, Yuichi
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[J]. SURFACE & COATINGS TECHNOLOGY, 2008, 202 (22-23): : 5234 - 5237
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Setsuhara, Yuichi
Cho, Ken
Takenaka, Kosuke
Ebe, Akinori
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Kondo, Hiroki
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[9] Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units
Setsuhara, Yuichi
Cho, Ken
Takenaka, Kosuke
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Sekine, Makoto
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Ikenaga, Eiji
Zaima, Shigeaki
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[10] Development of internal-antenna-driven large-area RF plasma sources using multiple low-inductance antenna units
Setsuhara, Y
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Ebe, A
Baba, S
Yamamoto, N
Takahashi, K
Ono, K
Miyake, S
[J]. SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 33 - 39

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