Analysis and Measurement of Stray Light in a Visible and Near-Infrared Imaging Spectrometer

被引:0
|
作者
Luo, Chao [1 ,2 ,3 ,4 ]
Chen, Xinhua [1 ,2 ,3 ,4 ]
Zhao, Zhicheng [1 ,2 ,3 ,4 ]
Pan, Qiao [1 ,2 ,3 ,4 ]
Tang, Minxue [1 ,2 ,3 ,4 ]
Shen, Weimin [1 ,2 ,3 ,4 ]
机构
[1] Soochow Univ, Coll Phys Optoelect & Energy, Suzhou 215006, Peoples R China
[2] Soochow Univ, Collaborat Innovat Ctr Suzhou Nano Sci & Technol, Suzhou 215006, Peoples R China
[3] Soochow Univ, Key Lab Adv Opt Mfg Technol Jiangsu Prov, Suzhou 215006, Peoples R China
[4] Soochow Univ, Key Lab Modern Opt Technol, Educ Minist China, Suzhou 215006, Peoples R China
关键词
imaging spectrometer; notch method; veiling glare index; uncertainty evaluation;
D O I
10.1117/12.2501130
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the generation mechanism of stray light in a visible and near infrared imaging spectrometer with a spectral range of 400nm to 900nm is analyzed. The optical mechanical model of the instrument was established and its stray light level was simulated. Based on the notch method, a stray light measuring device was built. The veiling glare index of the imaging spectrometer was measured to be 0.84%. The uncertainty of measurement was assessed by GUM method, and the influence of uncertainty components on the measurement results was analyzed. When the confidence probability of the measuring device is 95.45%, the measurement uncertainty of veiling glare index is 0.15%. Finally, a comparison and analysis was made between the simulated values of the veiling glare index and the actual measured ones. This work provides technical support for the further development of high resolution imaging spectrometer.
引用
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页数:10
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