Pulse Current Generator with Improved Waveform Fidelity for High Voltage Capacitively-Coupled Plasma System

被引:0
|
作者
Chae, Beomseok [1 ]
Min, Juhwa [1 ]
Suh, Yongsug [1 ]
Kim, Hyejin [2 ]
Kim, Hyunbae [2 ]
机构
[1] Chonbuk Natl Univ, Dept Elect Engn, Jeonju, South Korea
[2] Samsung Elect, Mfg Technol Ctr, Hwaseong, South Korea
关键词
Plasma power supply; Current source converter; Capacitively coupled plasma; pulse power supply;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
This paper proposes a novel structure of power converter solution on the basis of current source type topology for a highly capacitively-coupled plasma application system. In overall system, two current sources are connected in parallel to generate the different output current of high precision in different switching intervals. The overall system consists of four major functional blocks; bias current generator, bias current modulator, slope current generator, and slope current modulator. The proposed solution also employs SiC MOSFET type power semiconductor switch of 1200V/90A in order to meet the fast transient requirement. The proposed converter system successfully satisfies the specification of output voltage of 4.5kV and output current of 40A with the rising/falling time of less than 100ns. This proposed topology makes it possible to accurately shape the output load voltage in a highly capacitively-coupled plasma application system with reduced level of voltage spike and distortion as compared to the state-of-the-arts solutions of voltage source type converters.
引用
收藏
页码:7179 / 7185
页数:7
相关论文
共 50 条
  • [1] Pulse current generator with improved waveform fidelity for high-voltage capacitively coupled plasma systems
    Beomseok Chae
    Juhwa Min
    Yongsug Suh
    Hyejin Kim
    Hyunbae Kim
    [J]. Journal of Power Electronics, 2020, 20 : 1316 - 1327
  • [2] Pulse current generator with improved waveform fidelity for high-voltage capacitively coupled plasma systems
    Chae, Beomseok
    Min, Juhwa
    Suh, Yongsug
    Kim, Hyejin
    Kim, Hyunbae
    [J]. JOURNAL OF POWER ELECTRONICS, 2020, 20 (05) : 1316 - 1327
  • [3] Current-Source-Type Pulse Current Generator With Reduced Waveform Distortion for Capacitively Coupled Plasma Systems
    Chae, Beomseok
    Min, Juhwa
    Suh, Yongsug
    Kim, Hyejin
    Kim, Hyunbae
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2021, 57 (03) : 2578 - 2590
  • [4] CAPACITIVELY COUPLED GAAS CURRENT WAVEFORM GENERATOR
    SHOJI, M
    DORMAN, PW
    [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1968, 56 (09): : 1613 - +
  • [5] The study of capacitively-coupled hydrogen plasma at very high frequency
    Li Yan-Yang
    Yang Shi-E
    Chen Yong-Sheng
    Zhou Jian-Peng
    Li Xin-Li
    Lu Jing-Xiao
    [J]. ACTA PHYSICA SINICA, 2012, 61 (16)
  • [6] A technique for evaluating the RF voltage across the electrodes of a capacitively-coupled plasma reactor
    Lisovskiy, V.
    Booth, J. -P.
    Landry, K.
    Douai, D.
    Cassagne, V.
    Yegorenkov, V.
    [J]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2006, 36 (02): : 177 - 182
  • [7] AN IMPROVED HIGH-VOLTAGE WAVEFORM GENERATOR
    KREIN, PT
    KERVIN, DJ
    CROWLEY, JM
    [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1983, 16 (12): : 1234 - 1237
  • [8] Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma
    Rauf, Shahid
    Tian, Peng
    Kenney, Jason
    Dorf, Leonid
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2022, 40 (03):
  • [9] High voltage arbitrary waveform pulse generator at automatic parametric tester
    Pan, Yang
    Yu, James
    Kim, Jay
    Griffiths, Peter
    [J]. 2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2, 2007, : 250 - +
  • [10] Electrotechnical Control and Current Protection System of the High-Voltage Pulse-Current Generator
    Nazarova, Natalia
    Vinnichenko, Dmitriy
    [J]. 2017 IEEE FIRST UKRAINE CONFERENCE ON ELECTRICAL AND COMPUTER ENGINEERING (UKRCON), 2017, : 574 - 577