Study on Ablation Threshold of Fused Silica Glass by Femtosecond Laser Induced Backside Wet Etching

被引：0
|
作者：
Yu, Jinlong [1 ,2 ]
Sun, Xiaoyan [1 ,2 ]
Hu, Youwang [1 ,2 ]
Cui, Dongmei [1 ,2 ]
Chen, Guowei [1 ,2 ]
机构：
[1] Cent S Univ, State Key Lab High Performance Complex Mfg, Changsha 410083, Hunan, Peoples R China
[2] Cent S Univ, Coll Mech & Elect Engn, Changsha 410083, Hunan, Peoples R China
来源：
TENTH INTERNATIONAL CONFERENCE ON INFORMATION OPTICS AND PHOTONICS | 2018年 / 10964卷
基金：
国家重点研发计划;
关键词：
Ablation threshold; fused silica; processing efficiency; surface morphology;
D O I：
10.1117/12.2506061
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
This article presents the research on the ablation threshold of fused silica glass processed by femtosecond laser in different environments, such as air, distilled water, and pure alcohol solution. At present, studies on ultra-short pulse lasers on materials mainly focus on the ablation threshold and material removal mechanism of specific materials. By analyzing the ablation threshold of the material, the laser processing efficiency can be greatly improved. Therefore, this paper mainly studied the material removal mechanism of fused silica and calculated the ablation threshold of fused silica in different environments. By analyzing the experimental results, we found that the surface-ablation threshold of fused silica glass can be relatively reduced in liquid environment relative to the air environment. Compared with distilled water, the surface-ablation threshold in pure alcohol solution can be significantly decreased. Besides, by comparing the results, the surface morphology quality in the liquid solutions is superior to the air. The research content of this article has given a certain theoretical guidance for the processing of transparent materials and laid a certain foundation for subsequent research work.
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页数：6
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