Effect of organic additives on the electrocrystallization and the magnetoresistance of Cu-Co multilayers

被引:39
|
作者
Chassaing, E [1 ]
机构
[1] CNRS, Ctr Etud Chim Met, F-94407 Vitry Sur Seine, France
关键词
D O I
10.1149/1.1401079
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electrodeposition of Cu-Co multilayers was investigated in the presence of two additives, sodium dodecylsulfate (SDS) and saccharin. Cyclic voltammetry, steady-state polarization, impedance spectroscopy, and potential pulses were carried out using an electrochemical quartz crystal microbalance. Magnetoresistance measurements were performed on Cu-Co multilayers deposited on indium tin oxide g-lass. Saccharin strongly inhibits the discharge of cobalt whereas SDS has a depolarizing effect. However the reaction path is not markedly changed. The deposition of cobalt starts with a strong evolution of hydrogen due to diffusion-controlled reduction of protons. The giant magnetoresistance ratio is markedly reduced by these additives. (C) 2001 The Electrochemical Society.
引用
收藏
页码:C690 / C694
页数:5
相关论文
共 50 条
  • [1] Giant magnetoresistance in periodic and aperiodic electrodeposited Cu-Co multilayers
    Nallet, P
    Chassaing, E
    Morrone, A
    Schmidt, JE
    INTERCONNECT AND CONTACT METALLIZATION, 1998, 97 (31): : 84 - 95
  • [2] Dependence of interface roughness and diffuseness of Cu-Co electrodeposited multilayers on electrochemical additives
    Merkourakis, S
    Hÿtch, MJ
    Chassaing, E
    Walls, MG
    Leprince-Wang, Y
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (05) : 3035 - 3040
  • [3] ELASTIC PROPERTIES OF CU-CO MULTILAYERS
    DUTCHER, JR
    LEE, S
    ENGLAND, CD
    STEGEMAN, GI
    FALCO, CM
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1990, 126 : 13 - 18
  • [4] Magnetoresistance effect in Gd-doped Cu-Co alloys
    Jaworski, Jacek
    Strzala, Alicja
    Kwon, Oh-Jib
    Fleury, Eric
    JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 492 (1-2) : 56 - 60
  • [5] EFFECT OF OXYGEN INCORPORATION ON MAGNETORESISTANCE IN CO/CU MULTILAYERS
    KAGAWA, K
    KANO, H
    OKABE, A
    SUZUKI, A
    HAYASHI, K
    JOURNAL OF APPLIED PHYSICS, 1994, 75 (10) : 6540 - 6542
  • [6] Magnetoresistance in Cu-Co granular films and Co/Cu/Co sandwiches
    Wang, H
    Jin, QY
    Chu, C
    Shen, YH
    Chen, HF
    Li, FM
    Bie, QS
    Lu, M
    Zhai, HR
    THIRD INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 1998, 3175 : 440 - 443
  • [7] GIANT MAGNETORESISTANCE IN HETEROGENEOUS CU-CO ALLOYS
    BERKOWITZ, AE
    MITCHELL, JR
    CAREY, MJ
    YOUNG, AP
    ZHANG, S
    SPADA, FE
    PARKER, FT
    HUTTEN, A
    THOMAS, G
    PHYSICAL REVIEW LETTERS, 1992, 68 (25) : 3745 - 3748
  • [8] Characterization of electrodeposited Cu-Co magnetic multilayers
    Nallet, P
    Chassaing, E
    JOURNAL DE PHYSIQUE IV, 1996, 6 (C7): : 177 - 182
  • [9] Interface characterization in electrodeposited Cu-Co multilayers
    Nallet, P
    Chassaing, E
    Walls, MG
    Hytch, MJ
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (09) : 6884 - 6889
  • [10] MAGNETORESISTANCE IN BULK CU-CO BASED ALLOYS
    WECKER, J
    VONHELMOLT, R
    SCHULTZ, L
    SAMWER, K
    IEEE TRANSACTIONS ON MAGNETICS, 1993, 29 (06) : 3087 - 3089