Giant anomalous Hall effect in ultrathin Si/Fe bilayers

被引:8
|
作者
Das, S. S. [1 ]
Kumar, M. Senthil [1 ]
机构
[1] Indian Inst Technol, Dept Phys, Bombay 400076, Maharashtra, India
关键词
Anomalous Hall effect; Magnetron sputtering; Magnetic multilayers; Hall coefficients; Hall resistance;
D O I
10.1016/j.matlet.2014.12.042
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Anomalous Hall effect studies on ultrathin Si(50 angstrom)/Fe(t(Fe)) bilayers were performed at 300 K. Giant enhancements of about 60 times in saturation anomalous Hall resistivity and 265 times in anomalous Hall coefficient (R-s) were observed upon decreasing the Fe layer thickness t(Fe) from 200 to 10 angstrom. The R-s observed for t(Fe)=10 angstrom is about three orders of magnitude larger than that of bulk Fe. Scaling law between R-s and longitudinal electrical resistivity (rho) suggests that the side jump is the dominant mechanism of the anomalous Hall effect. The observed largest Hall sensitivity of 433 Omega/T surpasses that of the semiconducting GaAs and InAs Hall sensors already reported. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:317 / 319
页数:3
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