Spontaneous Oxidative Addition of σ-Si-Si Bonds at Gold

被引：57
|
作者：
Gualco, Pauline [3 ,4 ]
Ladeira, Sonia [2 ]
Miqueu, Karinne [1 ]
Amgoune, Abderrahmane [3 ,4 ]
Bourissou, Didier [3 ,4 ]
机构：
[1] Univ Pau & Pays Adour Helioparc, Inst Pluridisciplinaire Rech Environm & Mat, UMR 5254, Equipe Chim Phys, F-64053 Pau 09, France
[2] Univ Toulouse 3, Inst Chim Toulouse, FR2599, F-31062 Toulouse, France
[3] Univ Toulouse 3, Lab Heterochim Fondamentale & Appl, UPS, LHFA, F-31062 Toulouse 09, France
[4] CNRS, LHFA, UMR 5069, F-31062 Toulouse, France
来源：
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2011年 / 50卷 / 36期
关键词：
density functional calculations; gold; oxidative addition; silicon; X-ray diffraction; METAL SILYL COMPLEXES; SILICON-SILICON; CATALYSIS; ACTIVATION; LIGANDS; REACTIVITY; GOLD(III); PLATINUM; BORANE; OXYARYLATION;
D O I：
10.1002/anie.201103719
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Gold can do it! The activation of disilanes at gold was observed experimentally and analyzed theoretically. Upon chelation with two or even only one phosphine donor, the oxidative addition of σ-Si-Si bonds proceeds readily at low temperatures. These results show an unexpected similarity between gold and the other late transition metals towards σ bond activation. © 2011 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：8320 / 8324
页数：5
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