Phonon-assisted carrier cooling in h-BN/graphene van der Waals heterostructures

被引:0
|
作者
Borah, Sangkha [1 ]
Yadav, Dinesh [1 ,2 ]
Trushin, Maxim [3 ,4 ,5 ]
Pauly, Fabian [1 ,2 ]
机构
[1] Okinawa Inst Sci & Technol Grad Univ, Onna, Okinawa 9040495, Japan
[2] Univ Augsburg, Inst Phys, D-86135 Augsburg, Germany
[3] Natl Univ Singapore, Inst Funct Intelligent Mat, Singapore 117544, Singapore
[4] Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117575, Singapore
[5] Natl Univ Singapore, Ctr Adv 2D Mat, Singapore 117546, Singapore
关键词
BORON-NITRIDE; GRAPHENE;
D O I
10.1103/PhysRevB.105.245419
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Being used in optoelectronic devices as ultrathin conductor-insulator junctions, detailed investigations are needed about how exactly h-BN and graphene hybridize. Here we present a comprehensive ab initio study of hot carrier dynamics governed by electron-phonon scattering at the h-BN/graphene interface, using graphite (bulk), monolayer, and bilayer graphene as benchmark materials. In contrast to monolayer graphene, all multilayer structures possess low-energy optical phonon modes that facilitate carrier thermalization. We find that the h-BN/graphene interface represents an exception with a comparatively weak coupling between low-energy optical phonons and electrons. As a consequence, the thermalization bottleneck effect, known from graphene, survives hybridization with h-BN, but is substantially reduced in all other bilayer and multilayer cases considered. In addition, we show that the quantum confinement in bilayer graphene does not have a significant influence on the thermalization time compared to graphite and that bilayer graphene can hence serve as a minimal model for the bulk counterpart.
引用
收藏
页数:11
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