In-situ and real-time investigation of ZnO thin films growth onto rigid and flexible substrates

Zinc Oxide (ZnO) has emerged as one of the most promising TCO materials due to its intrinsic properties. In this work, in-situ and real-time Vis-fUV Spectroscopic Ellipsometry (SE) (1.5-6.5 eV) has been employed for the monitoring of the growth of ZnO thin films. Films were firstly deposited on Si substrates in order to find the optimum deposition conditions and then to Poly-Ethylene Terephthalate and Poly-Ethylene Naphthalate substrates, using the Magnetron Sputtering technique. The ability of acquiring real-time measurements simultaneously and rapidly at 32 wavelengths at the 3-6.5 eV spectral region, provided accurately the thin films material response. By the analysis of the measured SE spectra, using the appropriate models, it has been determined in detail the time dependence of thickness and optical parameters of the films, providing significant insight on the ZnO growth mechanisms from the early stages of growth.