Theory of magnetic-field-sensitive metal-oxide-semiconductor field-effect transistors

被引:15
|
作者
Dobrovolsky, VN [1 ]
Krolevets, AN [1 ]
机构
[1] Natl Taras Shevchenko Univ Kiev, Dept Radiophys, UA-252127 Kiev, Ukraine
关键词
D O I
10.1063/1.369187
中图分类号
O59 [应用物理学];
学科分类号
摘要
Magnetic-field-sensitive metal-oxide-semiconductor field-effect transistors (MAGFETs) are used as magnetic field sensors. The Hall effect in the high-resistance channel region near the drain ensures a high magnetic field sensitivity of the transistor. In this case, the channel is nonuniform, and this fact presents difficulties when developing a Hall effect theory (the well-known theory of the Hall effect for uniform wafers is now inapplicable). Here, we propose a method that reduces the theory of galvanomagnetic effects in the MAGFETs with nonuniform channels to that for uniform wafers. Basing on this method, as well as on the conformal mapping and the Hall field symmetry, we calculate the Hall electromotive force in MAGFET channels with the Hall taps and split drain. The Hall current in MAGFETs with the split drain and split source is also obtained. It is shown that MAGFET magnetoresistance may be high. (C) 1999 American Institute of Physics. [S0021-8979(99)02703-6].
引用
下载
收藏
页码:1956 / 1960
页数:5
相关论文
共 50 条
  • [1] Theory of magnetic-field-sensitive metal-oxide-semiconductor field-effect transistors
    Univ of Kiev, Kiev, Ukraine
    J Appl Phys, 3 (1956-1960):
  • [3] INTERFACE STATES IN METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
    SEQUIN, C
    BALDINGER, E
    SOLID-STATE ELECTRONICS, 1970, 13 (12) : 1527 - +
  • [4] On the threshold voltage of metal-oxide-semiconductor field-effect transistors
    Shi, XJ
    Wong, M
    SOLID-STATE ELECTRONICS, 2005, 49 (07) : 1179 - 1184
  • [5] Mitigation of Complementary Metal-Oxide-Semiconductor Variability with Metal Gate Metal-Oxide-Semiconductor Field-Effect Transistors
    Yang, Ji-Woon
    Park, Chang Seo
    Smith, Casey E.
    Adhikari, Hemant
    Huang, Jeff
    Heh, Dawei
    Majhi, Prashant
    Jammy, Raj
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (04)
  • [6] Multigate transistors as the future of classical metal-oxide-semiconductor field-effect transistors
    Ferain, Isabelle
    Colinge, Cynthia A.
    Colinge, Jean-Pierre
    NATURE, 2011, 479 (7373) : 310 - 316
  • [7] CHARACTERISTICS OF TIN GATE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
    WITTMER, M
    NOSER, JR
    MELCHIOR, H
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) : 1423 - 1428
  • [8] Electron scattering in Ge metal-oxide-semiconductor field-effect transistors
    Lan, H. -S.
    Chen, Y. -T.
    Hsu, William
    Chang, H. -C.
    Lin, J. -Y.
    Chang, W. -C.
    Liu, C. W.
    APPLIED PHYSICS LETTERS, 2011, 99 (11)
  • [9] SURFACE MOBILITY FLUCTUATIONS IN METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
    SURYA, C
    HSIANG, TY
    PHYSICAL REVIEW B, 1987, 35 (12) : 6343 - 6347
  • [10] CRITICAL CURRENTS OF SUPERCONDUCTING METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
    KLEINSASSER, AW
    JACKSON, TN
    PHYSICAL REVIEW B, 1990, 42 (13): : 8716 - 8719