LITHOGRAPHY Lithography beyond the diffraction limit exploits Rabi oscillations

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作者：
Overton, Gail
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LASER FOCUS WORLD | 2012年 / 48卷 / 01期
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：24 / +
页数：2
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