Sublimation growth of silicon carbide bulk crystals:: experimental and theoretical studies on defect formation and growth rate augmentation

被引:74
|
作者
Hofmann, D
Bickermann, M
Eckstein, R
Kölbl, M
Müller, SG
Schmitt, E
Weber, A
Winnacker, A
机构
[1] Univ Erlangen Nurnberg, Dept Mat Sci, D-91058 Erlangen, Germany
[2] SiCrystal AG, D-92275 Eschenfelden, Germany
关键词
SiC bulk crystal growth; physical vapor transport; micropipe formation; modelling of SiC sublimation growth;
D O I
10.1016/S0022-0248(98)01212-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
SiC crystals of 30-40 mm diameter were grown by physical vapor transport (PVT). The defect generation during seeding and subsequent growth was investigated. The main origin of micropipes in crystals grown on micropipe free/reduced seeds is correlated with second-phase formation, especially with the occurrence of C inclusions. Stress and micropipe densities are found to depend on the axial temperature gradients. Radial and axial temperature gradients were determined by the application of numerical modelling. Finally, the growth rate during PVT processing of SiC crystals was studied theoretically and experimentally. Both, a better control of vapor composition and a time-dependent variation of thermal boundary conditions are proposed for an augmentation of the crystallization rate. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1005 / 1010
页数:6
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