A 206-294GHz 3-stage Amplifier in 35nm InP mHEMT, Using a Thin-film Microstrip Environment

被引:0
|
作者
Griffith, Zach [1 ]
Ha, Wonill [1 ]
Chen, Peter [1 ]
Kim, Dae-Hyun [1 ]
Brar, Bobby [1 ]
机构
[1] Teledyne Sci Co, Thousand Oaks, CA 91360 USA
关键词
InP metamorphic high electron mobility transistor (InP mHEMT); E-mode transistor; millimeter Wave; MMIC; low-loss dielectric layer; multiple interconnect layers; thin-film microstrip;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a compact, 3-stage millimeter-wave monolithic integrated circuit (MMIC) amplifier with an operating frequency of 206-294 GHz, formed by common-source configured 35 nm L-g InP mHEMTs and a multilayer thin-film microstrip (TFM) wiring environment. The amplifier S-21 mid-band gain is 11-16 dB, 3 dB bandwidth at 294 GHz, and 82.5 mW P-DC. This is the first reported InP HEMT MMIC operating in G-, H-band employing thinfilm microstrip. Because the TFM ground-plane shields the signal interconnects from the substrate, well behaved device (0.1-67, 140-200,210-310 GHz) and amplifier (206-320 GHz) measurements are presented from an unthinned, 25 mil substrate. The total size of this 3-stage amplifier is only 0.77x0.40 mm(2).
引用
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页码:57 / 60
页数:4
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