Conducted EMI suppression in plasma cutting power supply

被引：4
|
作者：
Esmaeli, A [1 ]
Li, S
Ke, Z
机构：
[1] Iranian Nucl Regulatory Author, Natl Radiat Protect Dept, Tehran, Iran
[2] Harbin Inst Technol, Elect Engn & Automat Sch, Harbin 150001, Peoples R China
来源：
PLASMA SCIENCE & TECHNOLOGY | 2005年 / 7卷 / 06期
关键词：
conducted electromagnetic interference (EMI); plasma cutting power supply; electromagnetic compatibility (EMC); saber designer; filter design;
D O I：
10.1088/1009-0630/7/6/024
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
A systematic approach to the design of the conducted electromagnetic interference (EMI) filter of high-density plasma cutting power supply has been developed. Converter components have been accurately modeled, with parasitic elements extracted to reveal their impacts on the EMI noises. Circuit simulations have been used to analyze and minimize the EMI noises. Conducted EMI noise measurement and filter design of this power supply have been achieved which successfully satisfy the FCC class B limits in the frequency range from 150 kHz to 30 MHz. The analyses and experimental results show that the designed filter guarantees that the required attenuation will be achieved.
引用
收藏
页码：3170 / 3173
页数：4
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