Optimization of CuO Ultra Thin Film for Gas Sensor Application by RF Magnetron Sputtering

被引：3
|
作者：
Gopalakrishnan, N. [1 ]
Balakrishnan, L. [2 ]
Arunkumar, B. [3 ]
Gowrishankar, S. [1 ]
机构：
[1] Natl Inst Technol, Dept Phys, Thin Film Lab, Tiruchirappalli 620015, Tamil Nadu, India
[2] VIT Univ, Sch Adv Sci, Div Mat Phys, Vellore 632014, Tamil Nadu, India
[3] Indian Inst Technol, Dept Phys, Bombay 400076, Maharashtra, India
来源：
JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | 2014年 / 9卷 / 04期
关键词：
CuO; Ultra Thin Film; RF Magnetron Sputtering; Gas Sensor; Ammonia; Methanol; COPPER-OXIDE; CUPROUS-OXIDE;
D O I：
10.1166/jno.2014.1614
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The present work focuses the optimization of p-CuO ultra thin films (UTF) for gas sensing applications by varying growth temperature. The p-CuO UTFs have been deposited on glass substrate at various substrate temperatures by RF magnetron sputtering. The CuO film deposited at a substrate temperature of 200 degrees C exhibits good electrical properties. The I-V characteristics of this optimized film has been studied in air, ammonia and methanol ambiences at various operating temperatures. The film showed better sensitivity at 200 degrees C and is more sensitive towards ammonia than methanol. Further, the films showed high response saturation above 1600 ppm of the analyte concentration.
引用
收藏
页码：496 / 501
页数：6
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