Effect of photosensitivity in acrylic photoreactive electrode pastes on line width uniformity for large-sized plasma display panels

被引:4
|
作者
Kim, Soon Hak
Kwon, Younghwan
Han, Yoon Soo
Hur, Youngjune
Kwak, Giseop
Woo, Chang Min
Hur, Byung Ki
Park, Lee Soon [1 ]
机构
[1] Kyungpook Natl Univ, Dept Polymer Sci, Taegu 702701, South Korea
[2] Kyungpook Natl Univ, Adv Display Mfg Res Ctr, Taegu 702701, South Korea
[3] Daegu Gyeongbuk Inst Sci & Technol, Adv Nano Mat Res Team, Taegu 700742, South Korea
[4] Daegu Univ, Dept Chem Engn, Gyongsan 712714, Gyeongbuk, South Korea
关键词
lithography; photopolimerization; processing; radiation;
D O I
10.1002/app.27139
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Ag electrodes with line width uniformity for large-sized plasma display panels were successfully fabricated through a photolithographic process using photosensitive Ag pastes with optimized photosensitive properties. The photosensitivity of the Ag electrode pastes in the photolithographic process was investigated as a function of the types and contents of photoinitiators, the molecular weights and acid values of acrylic binders with carboxylic acid groups, and the process variables, such as the UV-light intensity and dose, with a step tablet. This study revealed that the photoinitiator was a major parameter for the photosensitivity of the Ag electrode pastes. With the photosensitivity of the photosensitive Ag electrode pastes optimized by the study of the photoinitiator contents, Ag electrodes with line width uniformity were achieved with an HSP-188 photoinitiator content of 15 wt % on the basis of the reactive monomers, regardless of the variation of the light dose from 250 2 2 to 350 mJ/cm(2) and intensity from 15 to 25 mW/cm(2). (C) 2007 Wiley Periodicals, Inc.
引用
收藏
页码:658 / 666
页数:9
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