The atomic structure of InAs quantum dots on GaAs(112)A

被引:3
|
作者
Suzuki, T [1 ]
Temko, Y [1 ]
Xu, MC [1 ]
Jacobi, K [1 ]
机构
[1] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
关键词
molecular beam epitaxy; scanning tunneling microscopy; photoluminescence; faceting; gallium arsenide; indium arsenide; high-index single crystal surfaces; quantum dots;
D O I
10.1016/j.susc.2005.08.011
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The GaAs(1 1 2)A surface was prepared and InAs QDs were grown on it by molecular beam epitaxy and investigated using in situ scanning tunneling microscopy and reflection high-energy electron diffraction. We confirm and better specify an earlier result that the bare surface is not flat, but is facetted into {2 5 11}A, {1 1 0}, and (1 1 1)A facets forming shallow holes. The InAs wetting layer is not flat, but undulated and disordered, reflecting in part the structure of the bare surface. InAs QDs are formed with high number density typical for coherent QDs, i.e., without any lattice defect at the interface. However, the size distribution is quite broad what is considered to be typical for the A faces of GaAs substrates. From comparison with the literature we conclude on growth of coherent QDs. The shape of the InAs QDs is complementary to that of the holes at the bare surface. The QDs are rather flat entities. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:194 / 202
页数:9
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