Electromigration studies on Sn(Cu) alloy lines

被引:0
|
作者
Lu, CC [1 ]
Wang, SJ [1 ]
Liu, CY [1 ]
机构
[1] Natl Cent Univ, Dept Chem Engn & Mat Engn, Chungli 32054, Taiwan
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cu alloying effect in Sn(Cu) solder line has been studied. We found that the Sn0.7Cu solder tine has the most serious EM damage than pure Sn and Sn3.0Cu solder lines. The dominant factor for the fast EM rate in Sn0.7Cu could be attributed to the relatively small grain size and the low critical stress, i.e., the yielding stress of Sn0.7Cu solder line. Also, we found that the shortest Sn0.7Cu solder line, 250 jam, has most serious EM damage among three solder lines of different lengths. The back-stress induced by EM might not play a significant role on the EM test of long solder lines. A new failure mode of EM test, i.e., EM under an external tensile, was observed. The external stress would be superimposed on the stress profile induced by EM. As a result, the hillock formation at the anode side was retarded and void formation at the cathode was enhanced.
引用
收藏
页码:54 / 59
页数:6
相关论文
共 50 条
  • [1] Electromigration studies on Sn(Cu) alloy lines
    Lu, CC
    Wang, SJ
    Liu, CY
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (12) : 1515 - 1522
  • [2] Electromigration studies on Sn(Cu) alloy lines
    C. C. Lu
    S. J. Wang
    C. Y. Liu
    Journal of Electronic Materials, 2003, 32 : 1515 - 1522
  • [3] Electromigration studies of Sn(Cu) and Sn(Ni) alloy stripes
    C. C. Wei
    C. Y. Liu
    Journal of Materials Research, 2005, 20 : 2072 - 2079
  • [4] Electromigration studies of Sn(Cu) and Sn(Ni) alloy stripes
    Wei, CC
    Liu, CY
    JOURNAL OF MATERIALS RESEARCH, 2005, 20 (08) : 2072 - 2079
  • [5] Electromigration drift velocity in Al-alloy and Cu-alloy lines
    Hu, CK
    Lee, KY
    Lee, KL
    Cabral, C
    Colgan, EG
    Stanis, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (03) : 1001 - 1006
  • [6] Grain boundary diffusion, electromigration and segregation in Cu and Cu-2wt%Sn alloy
    Gupta, D
    DEFECT AND DIFFUSION FORUM, 1998, 156 : 161 - 161
  • [7] ELECTROMIGRATION OF SN-113 IN CU
    NEIDHARDT, A
    REINHOLD, U
    KRAUTHEIM, G
    ZEHE, A
    KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY, 1979, 14 (02): : 179 - 186
  • [8] A study of electromigration in Sn3.5Ag and Sn3.8Ag0.7Cu solder lines
    Ou, SQ
    Tu, KN
    55TH ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE, VOLS 1 AND 2, 2005 PROCEEDINGS, 2005, : 1445 - 1450
  • [9] Studies on solder bump electromigration in Cu/Sn-3Ag-0.5Cu/Cu system
    Yamanaka, Kimihiro
    Tsukada, Yutaka
    Suganuma, Katsuaki
    MICROELECTRONICS RELIABILITY, 2007, 47 (08) : 1280 - 1287
  • [10] Electromigration and diffusion in pure Cu and Cu(Sn) alloys
    Hu, CK
    Lee, KL
    Gupta, D
    Blauner, P
    MATERIALS RELIABILITY IN MICROELECTRONICS VI, 1996, 428 : 43 - 54