The reduction behavior of free chlorine at boron-doped diamond electrodes

被引：30
|
作者：
Watanabe, Takeshi [1 ]
Akai, Kazumi [1 ]
Einaga, Yasuaki [1 ,2 ]
机构：
[1] Keio Univ, Dept Chem, Kohoku Ku, 3-14-1 Hiyoshi, Yokohama, Kanagawa 2238522, Japan
[2] JST ACCEL, 3-14-1 Hiyoshi, Yokohama, Kanagawa 2238522, Japan
来源：
ELECTROCHEMISTRY COMMUNICATIONS | 2016年 / 70卷
关键词：
Boron-doped diamond; Free chlorine; Electrochemical sensor; Oxygen reduction reaction; ELECTROCHEMICAL-BEHAVIOR; HYPOCHLOROUS ACID; ALKALINE-SOLUTION; OXYGEN REDUCTION; PLATINUM;
D O I：
10.1016/j.elecom.2016.06.010
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The electrochemical reduction behavior of hypochlorite ions (ClO-) and hypochlorous acid (HClO) at the surface of boron-doped diamond electrodes is presented. The ClO- reduction behavior is strongly affected by the dissolved oxygen through homogeneous oxygen recovery reaction between ClO- and H2O2 as ORR product. As for HClO reduction, one-electron mechanism which is a peculiar characteristic of boron-doped diamond electrodes, was observed. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码：18 / 22
页数：5
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