Characterization on the temperature of radio frequency argon capacitive discharge mode transition at atmospheric pressure

被引:3
|
作者
Guo Qing-Chao [1 ]
Zhang Jia-Liang [1 ]
Liu Li-Ying [1 ]
Wang De-Zhen [1 ]
机构
[1] Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China
基金
中国国家自然科学基金;
关键词
atmospheric pressure plasma; discharge mode; rotational temperature; PLASMA; DEPOSITION;
D O I
10.7498/aps.60.025207
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The mode transition and coexistence were investigated in atmospheric pressure argon radio frequency capacitive discharge. By use of a program compiled by the authors for the nitrogen's second positive band simulation, comparison between the experimental and simulated spectra of band (0, 1) and (1, 2) was used to determine the rotational and vibrational temperatures of N-2. The trends of vibrational and rotational temperatures with discharge power were studied to observe the temperature jump corresponding to the discharge mode transition. Utilizing a well-known software named Lifbase, the simulated spectra of OH (A-X) (0, 0) was calculated to obtain the rotational temperature of OH by comparing with the experimental OH (A-X) (0, 0) band. The calculated rotational temperature of OH is well consistent with the result of nitrogen's second positive band, which shows that the neutral species are at thermal equilibrium in the space of discharge. According to the current-voltage characteristic, the temperature jump corresponding to the discharge mode transition was confirmed in accordance with the photograph of discharge.
引用
收藏
页数:8
相关论文
共 17 条
  • [1] Determination of electron temperature in laser-produced plasmas by isoelectronic X-ray spectroscopy
    Chen, B
    Zheng, ZJ
    Ding, YK
    Li, SW
    Wang, YM
    [J]. ACTA PHYSICA SINICA, 2001, 50 (04) : 711 - 714
  • [2] Fluorescence measurement and acoustic diagnostics of plasma channels in air
    Hao, ZQ
    Zhang, J
    Yu, J
    Zhang, Z
    Zhong, JY
    Zang, CZ
    Jin, Z
    Wang, ZH
    Wei, ZY
    [J]. ACTA PHYSICA SINICA, 2006, 55 (01) : 299 - 303
  • [3] HUBER KP, 1979, MOL SPECTRA MOL STRU, pR4
  • [4] Atmospheric plasma deposition of glass coatings on aluminum
    Ladwig, A.
    Babayan, S.
    Smith, M.
    Hester, M.
    Highland, W.
    Koch, R.
    Hicks, R.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2007, 201 (14): : 6460 - 6464
  • [5] Electrical probe calibration and power calculation for a miniature 13.56 MHz plasma source
    Leveille, V.
    Coulombe, S.
    [J]. MEASUREMENT SCIENCE AND TECHNOLOGY, 2006, 17 (11) : 3027 - 3032
  • [6] Li Y, 2009, DIABETES, V58, pA402
  • [7] Luque J., 1999, Technical Report MP-99-009
  • [8] Capacitive discharge mode transition in moderate and atmospheric pressure
    Moon, Se Youn
    Rhee, J. K.
    Kim, D. B.
    Gweon, B. M.
    Choe, W.
    [J]. CURRENT APPLIED PHYSICS, 2009, 9 (01) : 274 - 277
  • [9] Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
    Nowling, GR
    Babayan, SE
    Jankovic, V
    Hicks, RF
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (01): : 97 - 103
  • [10] Discharge phenomena of an atmospheric pressure radio-frequency capacitive plasma source
    Park, J
    Henins, I
    Herrmann, HW
    Selwyn, GS
    Hicks, RF
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 89 (01) : 20 - 28