A design model for random process variability

A new approach to analyze process variation through measured current variation is introduced. The methodology concludes with a simple and convenient posynomial model for random process variability to bridge the gap between existing statistical methods and circuit design. The model contains only design variables: transistor sizes W and L, and operating points V-gs and V-ds. Modeling random process variability in this way allows for adaptability to optimization problems, time efficient methods for gathering statistical information in comparison to Monte Carlo, and an alternative equation for hand analysis.