Selective and Sequential Re-Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric, Inorganic, and Their Composite Nanostructured Arrays

被引：8
|
作者：
Zu, Xihong [1 ,2 ]
Gong, Jian [1 ]
Tu, Weiping [2 ]
Deng, Yulin [1 ]
机构：
[1] Georgia Inst Technol, Sch Chem & Biomol Engn, Atlanta, GA 30332 USA
[2] S China Univ Technol, Sch Chem & Chem Engn, Guangzhou 510640, Guangdong, Peoples R China
来源：
MACROMOLECULAR RAPID COMMUNICATIONS | 2011年 / 32卷 / 19期
关键词：
arrays; block copolymers; composite; re-assembly; NANORING ARRAYS; RING ARRAYS; NANOPARTICLES;
D O I：
10.1002/marc.201100313
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
We report that the nanostructures of poly(styrene-block-4-vinylpyridine) block copolymer (PS-b-P4VP) thin film on a wafer substrate can be re-assembled by sequential vapor treatment using selected solvents. Metal or other inorganic nanoparticles that were randomly pre-loaded inside or on the surface of PS-b-P4VP thin film could be pulled to the rim of PS and P4VP along with the movements of PS and P4VP blocks during the treatment. As a result, the patterned polymeric or inorganic/polymer composite nanoisland and nanoring arrays were fabricated.
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页码：1526 / 1532
页数：7
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