Microwave dielectric relaxation of the polycrystalline (Ba, Sr)TiO3 thin films -: art. no. 182904

被引:18
|
作者
Moon, T [1 ]
Lee, B
Kim, TG
Oh, J
Noh, YW
Nam, S
Park, B
机构
[1] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151744, South Korea
[2] Seoul Natl Univ, Sch Elect Engn & Comp Sci, Seoul 151744, South Korea
[3] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151744, South Korea
关键词
D O I
10.1063/1.1923760
中图分类号
O59 [应用物理学];
学科分类号
摘要
The microwave dielectric properties of the (Ba,Sr)TiO3 thin films annealed at various oxygen pressures ranging from 5 to 500 mTorr were investigated over the frequency range 0.5-5 GHz using a circular-patch capacitor geometry. The dielectric constant (epsilon) followed Curie-von Schweidler relaxation in the microwave-frequency range; and the degree of relaxation corresponded qualitatively with the measured dielectric loss (tan delta). As the oxygen pressure varied, the dielectric loss had a maximum value of similar to 0.03 at 100 mTorr, and its behavior was correlated with the Raman strength of the polar modes. (c) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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