A general model for chemical erosion of carbon materials due to low-energy H+ impact

被引:11
|
作者
Liu, Shengguang [1 ]
Sun, Jizhong [1 ]
Dai, Shuyu [1 ]
Stirner, Thomas [2 ]
Wang, Dezhen [1 ]
机构
[1] Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Elect Beams, Dalian 116024, Peoples R China
[2] Univ Appl Sci Deggendorf, D-94469 Deggendorf, Germany
关键词
0001 GRAPHITE SURFACE; ION FLUX DENSITIES; HYDROCARBON FORMATION; PYROLYTIC-GRAPHITE; SPUTTERING YIELDS; PUMP LIMITER; ATOM IMPACT; TORE-SUPRA; HYDROGEN; BOMBARDMENT;
D O I
10.1063/1.3485821
中图分类号
O59 [应用物理学];
学科分类号
摘要
Modeling the chemical erosion of carbon materials due to low-energy H+ impact is of paramount importance for the prediction of the behavior of carbon-based plasma-facing components in nuclear fusion devices. In this paper a simple general model describing both energy and temperature dependence of carbon-based chemical erosion is presented. Enlightened by Hopf's model {Hopf et al., [J. Appl. Phys. 94, 2373 (2003)}, the chemical erosion is separated into the contributions from three mechanisms: thermal chemical erosion, energetic chemical sputtering, and ion-enhanced chemical erosion. Using input from the Monte Carlo code TRIDYN, this model is able to reproduce experimental data well. (C) 2010 American Institute of Physics. [doi:10.1063/1.3485821]
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页数:7
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