A Breaching of Electromagnetic Shielding by Narrow Aperture in Metal Film

被引：1

作者：

Park, Doo Jae ^{[1
]}

Chu, Hong ^{[2
]}

Kyoung, Jisoo ^{[3
]}

Choi, Soo Bong ^{[4
]}

机构：

[1] Hallym Univ, Dept Phys, Hallyimdaehaggil 1, Chunchon 24252, South Korea

[2] Laseroptek Co LTD, Hyundai 1 Valley,Galmachi Ro 244, Sungnam 13212, South Korea

[3] Samsung Elect Co, Samsung Adv Inst Technol, Suwon 24252, South Korea

[4] Incheon Natl Univ, Dept Phys, Inchon 22012, South Korea

来源：

JOURNAL OF THE OPTICAL SOCIETY OF KOREA | 2016年 / 20卷 / 05期

基金：

新加坡国家研究基金会;

关键词：

Electromagnetic shielding; Diffraction and scattering; Edge and boundary effects; NEAR-FIELD ENHANCEMENT; ARRAYS;

D O I：

10.3807/JOSK.2016.20.5.563

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report a theoretical research for the condition of electromagnetic shield breaching when a narrow aperture is punctured in thin metal film. To calculate electromagnetic field transmission through a narrow slit, a Rayleigh wave expansion has been applied for free standing, thin metal film. We found that the DC electric field allows perfect transmission when the length of the slit is infinite, regardless of the other geometrical factors such as slitwidth and thickness. Slitwidth dependent transmission spectra as a function of frequency shows a cutoff frequency that decreases almost linearly to the slitwidth, giving that almost successful shielding is only possible when the slitwidth is smaller than 1 micron.

引用

页码：563 / 566

页数：4

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