Effect of two types of surface sites on the characteristics of Si3N4-gate pH-ISFETs

被引:68
|
作者
Niu, MN [1 ]
Ding, XF [1 ]
Tong, QY [1 ]
机构
[1] SOUTHEAST UNIV,CTR MICROELECT,NANJING 210096,PEOPLES R CHINA
关键词
pH-ISFETs; Si3N4; films; site-binding model; ratio of silanol to amine sites; sensing characteristics;
D O I
10.1016/S0925-4005(97)80067-6
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Based on the site-binding model, the effects of two types of surface sites (namely, silanol sites and amine sites) and their ratio on the characteristics of an Si3N4-gate pH-ISFET are discussed. As the ratio beta of silanol sites to amine sites is about 7/3, the maximum of sensitivity of the electrolyte-insulator (E-I) interfacial potential versus the pH value, as well as of the range of linear response are theoretically obtained. The stability of pH-ISFET devices is partially determined by the total number of the two types of surface sites and their ratio. The theoretical results are shown to be supported by experimental results.
引用
收藏
页码:13 / 17
页数:5
相关论文
共 50 条
  • [1] Effect of two types of surface sites on the characteristics of Si3N4-gate pH-ISFET's
    Niu, MN
    Ding, XF
    Tong, QY
    ICSE '96 - 1996 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS, 1996, : 189 - 193
  • [2] Machine Learning on FPGA for Robust Si3N4-Gate ISFET pH Sensor in Industrial IoT Applications
    Sinha, Soumendu
    Sahu, Nishad
    Bhardwaj, Rishabh
    Mehta, Aditya
    Ahuja, Hitesh
    Srivastava, Satyam
    Elhence, Anubhav
    Chamola, Vinay
    IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2021, 57 (06) : 6700 - 6712
  • [3] DRIFT BEHAVIOR OF ISFETS WITH SI3N4-SIO2 GATE INSULATOR
    HEIN, P
    EGGER, P
    SENSORS AND ACTUATORS B-CHEMICAL, 1993, 14 (1-3) : 655 - 656
  • [4] Physical model for threshold voltage instability in Si3N4-gate H+-sensitive FET's (pH ISFET's)
    IBM Co, Encinitas, United States
    IEEE Trans Electron Devices, 6 (1239-1245):
  • [5] A physical model for threshold voltage instability in Si3N4-gate H+-sensitive FET's (pH ISFET's)
    Jamasb, S
    Collins, SD
    Smith, RL
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (06) : 1239 - 1245
  • [6] PH ISFETS USING AL2O3, SI3N4, AND SIO2 GATE THIN-FILMS
    MATSUO, T
    ESASHI, M
    ABE, H
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (11) : 1856 - 1857
  • [7] Study of effect of LPCVD Si3N4 film surface oxidation on characteristics of pH-ISFET
    Niu, Wencheng
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1993, 14 (05): : 313 - 317
  • [8] Light Effect Characterization of ISFET Based pH Sensor with Si3N4 Gate Insulator
    Noh, Nurul Izzati Mohammad
    Yusof, Khairul Aimi
    Abdullah, Ali Zaini
    Herman, Sukreen Hana
    Abdullah, Wan Fazlida Hanim
    2014 IEEE SYMPOSIUM ON COMPUTER APPLICATIONS AND INDUSTRIAL ELECTRONICS (ISCAIE), 2014,
  • [9] Modelling of reference electrode for a Si3N4 gate pH ISFET
    Hazarika, Chinmayee
    Dutta, Arup
    Sharma, Santanu
    2017 INTERNATIONAL CONFERENCE ON INNOVATIONS IN ELECTRONICS, SIGNAL PROCESSING AND COMMUNICATION (IESC), 2017, : 149 - 154
  • [10] Study on the hysteresis effect of pH-ISFET based on Beckman Φ™ 110 (Si3N4 gate pH-ISFET)
    Chou, JC
    Tseng, YN
    OPTOELECTRONIC MATERIALS AND DEVICES II, 2000, 4078 : 793 - 800