MEPHISTO spectromicroscope reaches 20 nm lateral resolution

被引：40
|
作者：
De Stasio, G [1 ]
Perfetti, L
Gilbert, B
Fauchoux, O
Capozi, M
Perfetti, P
Margaritondo, G
Tonner, BP
机构：
[1] Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland
[2] CNR, Ist Struttura Mat, I-00133 Rome, Italy
[3] Univ Roma Tor Vergata, Dipartimento Fis, I-00173 Rome, Italy
[4] Univ Wisconsin, Dept Phys, Milwaukee, WI 53211 USA
[5] Sincrotrone Trieste, I-34012 Trieste, Italy
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 03期
关键词：
D O I：
10.1063/1.1149661
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The recently described tests of the synchrotron imaging photoelectron spectromicroscope MEPHISTO (Microscope a Emission de PHotoelectrons par Illumination Synchrotronique de Type Onduleur) were complemented by further resolution improvements and tests, which brought the lateral resolution down to 20 nm. Images and line plot profiles demonstrate such performance. (C) 1999 American Institute of Physics. [S0034-6748(99)04902-3].
引用
收藏
页码：1740 / 1742
页数：3
相关论文
共 50 条
  • [1] MEPHISTO: Performance tests of a novel synchrotron imaging photoelectron spectromicroscope
    De Stasio, G
    Capozi, M
    Lorusso, GF
    Baudat, PA
    Droubay, TC
    Perfetti, P
    Margaritondo, G
    Tonner, BP
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (05): : 2062 - 2066
  • [2] Extreme ultraviolet lithography reaches 5 nm resolution
    Giannopoulos, Iason
    Mochi, Iacopo
    Vockenhuber, Michaela
    Ekinci, Yasin
    Kazazis, Dimitrios
    NANOSCALE, 2024, 16 (33) : 15533 - 15543
  • [3] Applications of high lateral and energy resolution imaging XPS with a double hemispherical analyser based spectromicroscope
    Escher, M.
    Winkler, K.
    Renault, O.
    Barrett, N.
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2010, 178 : 303 - 316
  • [4] THE OBJECTIVE LENS OF HIGH-RESOLUTION ELECTRON SPECTROMICROSCOPE
    OSAKI, M
    HONDA, T
    ISHIDA, Y
    KOBAYASHI, T
    ISODA, S
    UEDA, N
    JOURNAL OF ELECTRON MICROSCOPY, 1989, 38 (04): : 296 - 296
  • [5] EUV imaging with a 13 nm tabletop laser reaches sub-38 nm spatial resolution
    Vaschenko, Georgiy
    Brizuela, Fernando
    Brewer, Courtney
    Larotonda, Miguel A.
    Wang, Yong
    Luther, Bradley M.
    Marconi, Mario C.
    Rocca, Jorge J.
    Menoni, Carmen S.
    Chao, Weilun
    Anderson, Erik H.
    Liu, Yanwei
    Attwood, David T.
    EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U382 - U388
  • [6] THE CONSTRUCTION AND SPECIFICATIONS OF THE HIGH-RESOLUTION ELECTRON SPECTROMICROSCOPE
    UYEDA, N
    KOBAYASHI, T
    ISODA, S
    KOBAYASHI, K
    HONDA, T
    OSAKI, M
    HARADA, Y
    ETOH, T
    JOURNAL OF ELECTRON MICROSCOPY, 1989, 38 (04): : 271 - 271
  • [7] Hard x-ray Zernike microscopy reaches 30 nm resolution
    Chen, Yu-Tung
    Chen, Tsung-Yu
    Yi, Jaemock
    Chu, Yong S.
    Lee, Wah-Keat
    Wang, Cheng-Liang
    Kempson, Ivan M.
    Hwu, Y.
    Gajdosik, Vincent
    Margaritondo, G.
    OPTICS LETTERS, 2011, 36 (07) : 1269 - 1271
  • [8] Microscope yields 20-nm resolution
    Jones-Bey, H
    LASER FOCUS WORLD, 1999, 35 (06): : 15 - +
  • [9] Photon-beam lithography reaches 12.5 nm half-pitch resolution
    Solak, Harun H.
    Ekinci, Yasin
    Kaeser, Philipp
    Park, Sunggook
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (01): : 91 - 95
  • [10] SMART: A planned ultrahigh-resolution spectromicroscope for BESSY II
    Fink, R
    Weiss, MR
    Umbach, E
    Preikszas, D
    Rose, H
    Spehr, R
    Hartel, P
    Engel, W
    Degenhardt, R
    Wichtendahl, R
    Kuhlenbeck, H
    Erlebach, W
    Ihmann, K
    Schlogl, R
    Freund, HJ
    Bradshaw, AM
    Lilienkamp, G
    Schmidt, T
    Bauer, E
    Benner, G
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1997, 84 (1-3) : 231 - 250
12345