Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

被引:14
|
作者
Yang, Ki-Yeon [1 ]
Oh, Sang-Chul [1 ]
Park, Hyungwon [1 ]
Lee, Heon [1 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136713, South Korea
来源
关键词
NANOIMPRINT LITHOGRAPHY; SOL;
D O I
10.1116/1.3628585
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Hydrogen silsesquioxane (HSQ), a type of spin-on glass, is an attractive material for nanobio, semiconductor and photoelectronic applications because it can be transformed into SiO2 by a simple annealing process. Studies on the fabrication of nanosized structures are necessary for the simple and easy production of HSQ nanostructures because of their unique characteristics. In this study, a fabrication method was developed for HSQ nanostructures as small as 50 nm using a direct printing technique with a poly (dimethylsiloxane) (PDMS) mold. Using this technique, HSQ nanostructures can be fabricated on a curved substrate (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3628585]
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页数:4
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