Gate-Controlled One-Dimensional Channel on the Surface of a 3D Topological Insulator

被引:23
|
作者
Yokoyama, Takehito [1 ]
Balatsky, Alexander V. [2 ,3 ]
Nagaosa, Naoto [4 ,5 ]
机构
[1] Tokyo Inst Technol, Dept Phys, Tokyo 1528551, Japan
[2] Los Alamos Natl Lab, Div Theoret, Los Alamos, NM 87545 USA
[3] Los Alamos Natl Lab, Ctr Integrated Nanotechnol, Los Alamos, NM 87545 USA
[4] Univ Tokyo, Dept Appl Phys, Tokyo 1138656, Japan
[5] RIKEN, Cross Correlated Mat Res Grp CMRG, ASI, Wako, Saitama 3510198, Japan
关键词
CONDUCTANCE; BARRIER;
D O I
10.1103/PhysRevLett.104.246806
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We investigate the formation of one-dimensional channels on the topological surface under the gate electrode. The energy dispersion of these channels is almost linear in momentum, and its velocity and sign are sensitively dependent on the strength of the gate voltage. Consequently, the local density of states near the gated region has an asymmetric structure with respect to zero energy. In the presence of the electron-electron interaction, the correlation effect can be tuned by the gate voltage. We also suggest a tunneling experiment to verify the presence of these bound states.
引用
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页数:4
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