Amorphous intergranular films mitigate radiation damage in nanocrystalline Cu-Zr

被引:22
|
作者
Schuler, Jennifer D. [1 ,2 ]
Grigorian, Charlette M. [1 ]
Barr, Christopher M. [2 ]
Boyce, Brad L. [2 ]
Hattar, Khalid [2 ]
Rupert, Timothy J. [1 ]
机构
[1] Univ Calif Irvine, Dept Mat Sci & Engn, Irvine, CA 92697 USA
[2] Sandia Natl Labs, Mat Phys & Chem Sci, POB 5800, Albuquerque, NM 87185 USA
关键词
Complexion; Ion irradiation; Grain boundary segregation; Grain growth; Amorphous intergranular films; SITU ION-IRRADIATION; HIGH-TEMPERATURE STABILITY; GRAIN-BOUNDARY CHARACTER; COMPLEXION FORMATION; INDUCED SEGREGATION; INTERFACIAL PHASE; TOLERANCE; ALLOYS; DEFECT; HE;
D O I
10.1016/j.actamat.2019.12.048
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanocrystalline metals are promising radiation tolerant materials due to their large interfacial volume fraction, but irradiation-induced grain growth can eventually degrade any improvement in radiation tolerance. Therefore, methods to limit grain growth and simultaneously improve the radiation tolerance of nanocrystalline metals are needed. Amorphous intergranular films are unique grain boundary structures that are predicted to have improved sink efficiencies due to their increased thickness and amorphous structure, while also improving grain size stability. In this study, ball milled nanocrystalline Cu-Zr alloys are heat treated to either have only ordered grain boundaries or to contain amorphous intergranular films distributed within the grain boundary network, and are then subjected to in situ transmission electron microscopy irradiation and ex situ irradiation. Differences in defect density and grain growth due to grain boundary complexion type are then investigated. When amorphous intergranular films are incorporated within the material, fewer and smaller defect clusters are observed while grain growth is also limited, leading to nanocrystalline alloys with improved radiation tolerance. (C) 2020 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:341 / 354
页数:14
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