Characterization of low-k porous silica films incorporated with ethylene groups

被引：0
|
作者：
Uchida, Y [1 ]
Oikawa, M [1 ]
Ito, Y [1 ]
Akisawa, S [1 ]
Ishida, K [1 ]
机构：
[1] Teikyo Univ Sci & Technol, Yamanashi 4090193, Japan
来源：
ADVANCED METALLIZATION CONFERENCE 2003 (AMC 2003) | 2004年
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Characteristics of the porous silica film with ethylene groups prepared by using hydrolysis and condensation of BIS(Triethoxysilyl)Ethylene mixture with organic solvent, 2-Methylpentane-2,4-diol were evaluated. The evaluated Young's modulus was 4.5 GPa. A value of k<2 was obtained by using organic solvent whose MPD concentration in the solvent was over 75%. The gas adsorption analysis indicated that the porous silica film consisted of micropores and the peak pore size was smaller than 1 nm.
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页码：455 / 460
页数：6
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