Work function engineering via LaAlO3/SrTiO3 polar interfaces

被引:36
|
作者
Susaki, Tomofumi [1 ,2 ]
Makishima, Asahi [1 ]
Hosono, Hideo [1 ,3 ]
机构
[1] Tokyo Inst Technol, Secure Mat Ctr, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Japan Sci & Technol Agcy, Kawaguchi, Saitama 3320012, Japan
[3] Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
SPECTROSCOPY; FILMS;
D O I
10.1103/PhysRevB.84.115456
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
By in situ Kelvin probe measurement combined with pulsed laser deposition, we have observed a change in the work function of (Nb:)SrTiO3(100) as LaAlO3(100) polar film is deposited, which strongly depends on the termination of the SrTiO3(100) surface and on the presence of the insulating SrTiO3(100) buffer layer. A sharp work function drop with LaAlO3(100) film deposition on a TiO2-terminated SrTiO3(100) surface would indicate the contribution of high-density electron gas at the interface to the unusual work function lowering. The present finding demonstrates that insulator-on-insulator structures using polar films could be a powerful platform to design artificial electronic states.
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页数:5
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