Reduction reaction analysis of nanoparticle copper oxide for copper direct bonding using formic acid

被引:17
|
作者
Fujino, Masahisa [1 ]
Akaike, Masatake [1 ]
Matsuoka, Naoya [1 ]
Suga, Tadatomo [1 ]
机构
[1] Univ Tokyo, Dept Precis Engn, Bunkyo Ku, Tokyo 1138656, Japan
关键词
2 ALTERNATIVE MODES; THERMAL-DECOMPOSITION; ROOM-TEMPERATURE; SURFACE; ACTIVATION; SUPEROXIDE; ADSORPTION; OXIDATION; XPS;
D O I
10.7567/JJAP.56.04CC01
中图分类号
O59 [应用物理学];
学科分类号
摘要
Copper direct bonding is required for electronics devices, especially power devices, and copper direct bonding using formic acid is expected to lower the bonding temperature. In this research, we analyzed the reduction reaction of copper oxide using formic acid with a Pt catalyst by electron spin resonance analysis and thermal gravimetry analysis. It was found that formic acid was decomposed and radicals were generated under 200 degrees C. The amount of radicals generated was increased by adding the Pt catalyst. Because of these radicals, both copper(I) oxide and copper(II) oxide start to be decomposed below 200 degrees C, and the reduction of copper oxide is accelerated by reactants such as H-2 and CO from the decomposition of formic acid above 200 degrees C. The Pt catalyst also accelerates the reaction of copper oxide reduction. Herewith, it is considered that the copper surface can be controlled more precisely by using formic acid to induce direct bonding. (c) 2017 The Japan Society of Applied Physics
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页数:6
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