Differential reflection photometry of ultrathin dielectric layers on strongly absorbing materials

被引：0

作者：

Adamson, PV ^{[1
]}

机构：

[1] Estonian Acad Sci, Inst Phys, EE-2400 Tartu, Estonia

来源：

OPTICS AND SPECTROSCOPY | 1999年 / 86卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The differential reflection of light caused by ultrathin dielectric layers deposited on a strongly absorbing substrate was studied. The dependence of the differential reflection on the angle of incidence and parameters of media was analyzed. The measurement of differential reflection was shown to have a number of potentialities for the determination of parameters of ultrathin layers.

引用

页码：408 / 414

页数：7

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