Structure of annealed nanoindentations in n- and p-doped (001)GaAs

被引:2
|
作者
Le Bourhis, E. [1 ]
Patriarche, G. [2 ]
机构
[1] Univ Poitiers, Phys Mat Lab, CNRS, SP2MI Teleport,UMR 6630, F-86962 Futuroscope, France
[2] CNRS, Lab Photon & Nanostruct, UPR 20, F-91460 Marcoussis, France
关键词
annealing; doping profiles; elemental semiconductors; gallium arsenide; III-V semiconductors; nanoindentation; semiconductor doping; silicon; thermomechanical treatment; transmission electron microscopy; zinc; PLASTIC-DEFORMATION; MECHANICAL-PROPERTIES; DISLOCATION DYNAMICS; GAAS; SUBSTRATE; SEMICONDUCTORS; BEHAVIOR;
D O I
10.1063/1.3270420
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the structure of annealed nanoindentations realized at room temperature (RT) on (001) GaAs having either n or p doping under a large range of loads F-m (between 0.5 and 50 mN). Transmission electron microscopy was used to observe systematically the nanoindentation structures. The lengths of the rosette arms were multiplied by a factor of two to three during the annealing process at 500 degrees C and were determined to vary with F-m, which could be modeled considering the two step thermomechanical history. While almost no anisotropy was observed before annealing (after indentation at RT), the [110] arms were observed to extend almost twice as long as the [10] ones in n-doped specimens after annealing. This anisotropy was much reduced in p-doped specimens. Furthermore, almost no partial dislocations were observed whereas they were obvious in n-doped specimens before annealing.
引用
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页数:6
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