Modeling and plasma characteristics of high-power direct current discharge

被引：19

作者：

Chen, Lei ^{[1
]}

Cui, Suihan ^{[1
]}

Tang, Wei ^{[1
]}

Zhou, Lin ^{[1
]}

Li, Tijun ^{[1
]}

Liu, Liangliang ^{[2
,3
]}

An, Xiaokai ^{[1
]}

Wu, Zhongcan ^{[1
]}

Ma, Zhengyong ^{[1
]}

Lin, Hai ^{[1
]}

Tian, Xiubo ^{[1
]}

Fu, Ricky Ky ^{[2
,3
]}

Chu, Paul K. ^{[2
,3
]}

Wu, Zhongzhen ^{[1
]}

机构：

[1] Peking Univ, Sch Adv Mat, Shenzhen Grad Sch, Shenzhen 518055, Peoples R China

[2] City Univ Hong Kong, Dept Phys, Dept Mat Sci & Engn, Kowloon, Hong Kong, Peoples R China

[3] City Univ Hong Kong, Dept Biomed Engn, Kowloon, Hong Kong, Peoples R China

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2020年 / 29卷 / 02期

关键词：

thermal accumulation; sputtering-HPMS; ionization rate; deposition rate; ELECTRON-IMPACT IONIZATION; CROSS-SECTIONS; DEPOSITION; HIPIMS; ATOMS; FILMS; IONS;

D O I：

10.1088/1361-6595/ab681c

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

To obtain both high ionization and high deposition rate, a modified global model for a continuous high-power DC magnetron sputtering (C-HPMS) is established by considering the continuous generation of the hot electrons and the high temperature caused by continuous high-power discharge. The results show that the plasma density is on the order of 10(19) m(-3) for power densities of only 183 W cm(-2) (Al) and 117 W cm(-2) (Cu). The ionization rate exceeds 90% of high-power impulse magnetron sputtering (HiPIMS) (peak power density of 564 W cm(-2)) for a DC power density of 180 W cm(-2), and the total diffusion fluxes of the two targets are 26 (Al) and 30 (Cu) times that of conventional HiPIMS, leading to very high deposition rates. The work provides a theoretical basis for the realization of C-HPMS and gives an enlightenment to the development of deposition equipment for continuous high-power discharges.

引用

页数：12

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