XPS study of air exposed copper phthalocyanine ultra-thin films deposited on Si(111) native substrates

被引：0

作者：

Krzywiecki, M. ^{[1
]}

Grzadziel, L. ^{[1
]}

Ottaviano, L. ^{[2
]}

Parisse, P. ^{[2
]}

Santucci, S. ^{[2
]}

Szuber, J. ^{[1
]}

机构：

[1] Silesian Tech Univ, Dept Electron Technol, PL-44100 Gliwice, Poland

[2] Univ Aquila, Dept Phys, I-67010 Coppito, Italy

来源：

MATERIALS SCIENCE-POLAND | 2008年 / 26卷 / 02期

关键词：

copper phthalocyanine; CuPc; thin films; surface chemistry;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Results are presented of XPS characterization of ultra-thin copper phthalocyanine (CuPc) ( 16 nm-QCM controlled) films thermally deposited under UHV conditions on p- and n- type Si( 111) substrates covered by native oxide. Our attempt has been focused on comparative studies of thin films in terms of the stability and durability of CuPc layers after one year of aging in ambient atmosphere. The impact of the type of the substrate doping was also explored. Our results clearly prove that CuPc layers are chemically stable and durable after one year exposure to air. We also demonstrate the existence of the substrate doping impact on the CuPc ultra-thin film what might be caused by dipole effects.

引用

页码：287 / 294

页数：8

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