Ion induced spinodal dewetting of thin solid films

被引:22
|
作者
Repetto, Luca [1 ]
Batic, Barbara Setina [1 ]
Firpo, Giuseppe [1 ]
Piano, Emanuele [1 ]
Valbusa, Ugo [1 ]
机构
[1] Univ Genoa, Dipartimento Fis, I-16146 Genoa, Italy
关键词
POLYMER-FILMS; LIQUID-FILMS; INSTABILITY; NUCLEATION; SILICON; FORCES;
D O I
10.1063/1.4724178
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present experimental data and numerical simulations in order to show that the mechanism of spinodal dewetting is active during ion beam irradiation of thin solid films. The expected scaling law for the characteristic wavelengths versus the initial film thickness is modified by the presence of sputtering. The conclusion is fully supported by model simulation which shows a square law dependence for null sputtering yield and a bimodal trend when sputtering is included. This result is in contrast to earlier studies and opens the possibility to control and use ion induced dewetting for the fabrication of functional nanostructures. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4724178]
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页数:4
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