Photosensitive nanofibers for data recording and erasing

被引:13
|
作者
Khatri, Muzamil [1 ]
Ahmed, Farooq [2 ]
Ali, Shamshad [2 ]
Mehdi, Mujahid [3 ]
Ullah, Sana [1 ]
Duy-Nam, Phan [1 ]
Khatri, Zeeshan [1 ,2 ]
Kim, Ick Soo [1 ]
机构
[1] Shinshu Univ, Ueda, Nagano, Japan
[2] Mehran Univ Engn & Technol, Jamshoro, Sindh, Pakistan
[3] Soochow Univ, Suzhou, Peoples R China
关键词
Electrospinning; photosensitive; nanofiber mats; polyurethane; polystyrene; ELECTROSPUN NANOFIBERS; CELLULOSE NANOFIBERS; FABRICATION; FIBERS;
D O I
10.1080/00405000.2020.1761681
中图分类号
TB3 [工程材料学]; TS1 [纺织工业、染整工业];
学科分类号
0805 ; 080502 ; 0821 ;
摘要
Photosensitive nanofibers have been utilized in various applications such as everyday apparels, protective clothing, medical and sports wearables. Polyurethane (PU) electrospun nanofiber mats (ENMs) are considered as one of the strong, stretchable, breathable, hydrophobic and durable textile substrates having good coloration properties. The photosensitive spiropyran dye[1 '-3 '-dihydro-8-methoxy-1 ',3 ',3 '-trimethyl-6-nitrospiro2H-1-benzopyran-2,2 '-(2H)-Indole] (Ind) was successfully incorporated into PU and polystyrene (PS) nanofibers via electrospinning. The resultant ENMs were measured upon alternate irradiation with ultraviolet at wavelength of 365 nm for coloration and with visible light at (40 degrees C) for decoloration on a designed photomask of quick-response code at the minimum area (1 x 1 cm(2)) with multiple photo-switching. SEM images revealed smooth morphology of the Ind-PS ENM and Ind-PU ENM with a slight increase in fiber diameter. The results revealed that the Ind-PS ENM and Ind-PU ENM can potentially be considered for data recording/erasing or where such type of ENMs can be utilized. [GRAPHICS] .
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页码:429 / 436
页数:8
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